Practice Step 4: Simulation – Critical Dimension vs Wavelength - 3.6 | 3. Lithography Techniques and Innovations | Advanced Semiconductor Manufacturing
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3.6 - Step 4: Simulation – Critical Dimension vs Wavelength

Learning

Practice Questions

Test your understanding with targeted questions related to the topic.

Question 1

Easy

What does critical dimension (CD) refer to?

💡 Hint: Think about the smallest detail you can make in a circuit.

Question 2

Easy

What is the relationship between wavelength and critical dimension?

💡 Hint: If we got shorter light waves, we can draw smaller things.

Practice 4 more questions and get performance evaluation

Interactive Quizzes

Engage in quick quizzes to reinforce what you've learned and check your comprehension.

Question 1

What does a smaller wavelength in lithography typically allow?

  • Larger critical dimensions
  • Smaller critical dimensions
  • No effect on critical dimensions

💡 Hint: Remember the SLSC principle!

Question 2

True or False: Higher numerical aperture decreases resolution.

  • True
  • False

💡 Hint: Think about focusing light.

Solve 1 more question and get performance evaluation

Challenge Problems

Push your limits with challenges.

Question 1

If a new technique could reduce k to 0.3 while maintaining NA at 1.35 and λ at 10 nm, what would be the new critical dimension?

💡 Hint: Use the resolution formula we've been practicing.

Question 2

Discuss the trade-offs between using EUV and traditional photolithography methods. What factors should companies consider?

💡 Hint: Reflect on performance versus price.

Challenge and get performance evaluation