8.3.3. Etching Techniques

Try these first

1. 1.

   What is the primary purpose of wet etching?

   Hint

   Think about the process that involves using liquid chemicals.

2. 2.

   Name one characteristic of dry etching.

   Hint

   Recall the method that doesn't involve liquids.

3. 3.

   What is one advantage of dry etching?

   • Less expensive
   • High precision
   • Fast process

   Hint

   Consider which method allows for better control.

4. 4.

   True or False: Wet etching can be both isotropic and anisotropic.

   • True
   • False

   Hint

   Recall the definitions of isotropic and anisotropic.

5. 5.

   Design a MEMS structure that utilizes both wet etching and dry etching techniques. Discuss the benefits of each approach in your design.

   Hint

   Consider how the properties of each etching method complement one another.

6. 6.

   Explain a scenario where sacrificial layer etching could create a critical flaw in a MEMS device and how to mitigate it.

   Hint

   Think about interactions between layers during etching.