Practice High-k / Metal Gate (hkmg) Stack (9.3.2) - Performance Enhancement and Scaling Down Technologies
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High-k / Metal Gate (HKMG) Stack

Practice - High-k / Metal Gate (HKMG) Stack

Learning

Practice Questions

Test your understanding with targeted questions

Question 1 Easy

What does High-k stand for?

💡 Hint: Think about what allows thinner layers in transistors.

Question 2 Easy

Name one high-k dielectric material.

💡 Hint: It's widely used in semiconductor applications.

4 more questions available

Interactive Quizzes

Quick quizzes to reinforce your learning

Question 1

What is the primary purpose of using high-k dielectrics in modern transistors?

To enable thicker dielectric layers
To reduce leakage currents
To lower manufacturing costs

💡 Hint: Consider why the electrical characteristics of materials matter.

Question 2

True or False: Metal gates improve performance by increasing resistance.

True
False

💡 Hint: Think about how resistance affects conductivity.

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Challenge Problems

Push your limits with advanced challenges

Challenge 1 Hard

Evaluate how the transition from SiO₂ to high-k dielectrics could impact the future design of integrated circuits.

💡 Hint: Considering the trade-offs that accompany scalability may help frame your answer.

Challenge 2 Hard

Propose a method for testing the performance of transistors using high-k dielectrics versus traditional dielectrics.

💡 Hint: Reflect on the parameters and metrics important for performance evaluation.

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Reference links

Supplementary resources to enhance your learning experience.