9. Performance Enhancement and Scaling Down Technologies
Semiconductor device performance has improved through continuous scaling down of device dimensions, which is driven by Moore's Law. To overcome challenges like short-channel effects and rising leakage currents, new enhancement techniques and scaling innovations are employed. These advancements focus on innovative materials, architecture, and system integration that extend beyond traditional methods of scaling.
Sections
Navigate through the learning materials and practice exercises.
What we have learnt
- Performance enhancement of semiconductor devices relies on innovative scaling technologies and new materials.
- Short-channel effects and rising leakage currents present significant challenges for nodes below 7nm.
- Advanced techniques such as FinFETs, GAAFETs, and 3D integration are crucial for maintaining performance at smaller nodes.
Key Concepts
- -- Moore's Law
- Observation that the number of transistors on a microchip doubles approximately every two years, leading to increased performance and decreased costs.
- -- ShortChannel Effects
- Deterioration of the electrical characteristics of transistors as their dimensions scale down, particularly affecting control of the channel.
- -- GAAFET
- Gate-All-Around Field Effect Transistor, a type of transistor that improves control by surrounding the channel with the gate.
- -- EUV Lithography
- Extreme Ultraviolet Lithography, a cutting-edge technology that employs short wavelengths of light for etching ultra-small patterns on chips.
- -- MorethanMoore
- An approach that integrates functionalities such as analog, digital, memory, and sensors in a way that deviates from traditional scaling by focusing on system-level solutions.
Additional Learning Materials
Supplementary resources to enhance your learning experience.