Advanced Semiconductor Manufacturing | 4. Etching and Deposition Processes by Pavan | Learn Smarter
K12 Students

Academics

AI-Powered learning for Grades 8–12, aligned with major Indian and international curricula.

Academics
Professionals

Professional Courses

Industry-relevant training in Business, Technology, and Design to help professionals and graduates upskill for real-world careers.

Professional Courses
Games

Interactive Games

Fun, engaging games to boost memory, math fluency, typing speed, and English skills—perfect for learners of all ages.

games
4. Etching and Deposition Processes

The chapter presents a comprehensive overview of etching and deposition processes critical to semiconductor manufacturing. It outlines various etching mechanisms, equipment used for both deposition and etching, and specific methods such as Atomic Layer Deposition (ALD) and Reactive Ion Etching (RIE). The significance of achieving precise patterns and material integration challenges is emphasized as the industry moves towards increasingly complex nanostructures.

Sections

  • 4

    Etching And Deposition Processes

    Etching and deposition are critical processes in semiconductor manufacturing, essential for creating intricate layers on integrated circuits.

  • 4.1

    Introduction

    This section introduces the fundamental etching and deposition processes crucial for semiconductor manufacturing.

  • 4.2

    Problem Statement

    The section outlines the critical challenges faced in achieving nanoscale device fabrication, emphasizing uniform deposition, precise etching, and maintaining the integrity of multilayer structures.

  • 4.3

    Step 1: Etching Processes

    This section explores various etching processes crucial in semiconductor manufacturing, emphasizing types of etching, properties, and common chemistries.

  • 4.3.1

    Types Of Etching

    This section outlines the different types of etching processes used in semiconductor manufacturing, including their methods, properties, and applications.

  • 4.3.2

    Key Properties Of Etching

    Etching is a critical process in semiconductor manufacturing that involves selectively removing materials to create precise patterns in integrated circuits.

  • 4.3.3

    Common Etch Chemistries

    This section covers the various etch chemistries used in semiconductor manufacturing, including specific gases used to etch materials like SiO₂, Si₃N₄, and aluminum.

  • 4.4

    Step 2: Etching Equipment Overview

    This section provides an overview of various etching equipment used in semiconductor manufacturing processes, emphasizing the purpose and functionality of each type.

  • 4.4.1

    Plasma Etching System Schematic

    This section describes the schematic of a plasma etching system, highlighting its main components and functions in semiconductor manufacturing.

  • 4.5

    Step 3: Deposition Processes

    The deposition processes are crucial for building thin functional layers on semiconductor wafers, enabling the creation of various integrated circuit components.

  • 4.5.1

    Main Deposition Techniques

    This section delves into the primary deposition techniques used in semiconductor manufacturing, crucial for constructing functional layers on wafers.

  • 4.6

    Step 4: Deposition Equipment

    This section describes various deposition equipment used in semiconductor manufacturing, emphasizing their functions and nuances in creating thin films.

  • 4.6.1

    Ald Deposition Cycle

    The ALD Deposition Cycle encompasses a series of precise steps to deposit monolayers onto a substrate, ensuring high-quality thin films in semiconductor manufacturing.

  • 4.7

    Step 5: Example – Ald Simulation In Python

    This section presents a Python simulation example for Atomic Layer Deposition (ALD), illustrating how film thickness increases with the number of cycles.

  • 4.8

    Analysis And Observations

    This section highlights the integral roles of etching and deposition in creating advanced semiconductor devices, emphasizing their advantages and considerations.

  • 4.9

    Conclusion

    This section discusses the critical role of etching and deposition in the advancement of semiconductor manufacturing processes and introduces the next topics of study.

References

eepe-asm4.pdf

Class Notes

Memorization

What we have learnt

  • Etching and deposition are ...
  • Both etching and deposition...
  • Different techniques are em...

Final Test

Revision Tests