Practice Common Etch Chemistries (4.3.3) - Etching and Deposition Processes
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Common Etch Chemistries

Practice - Common Etch Chemistries

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Practice Questions

Test your understanding with targeted questions

Question 1 Easy

What gas is typically used to etch SiO₂?

💡 Hint: Think about fluorinated compounds.

Question 2 Easy

Which gas is used for etching Si₃N₄?

💡 Hint: Consider common gases with sulphur.

4 more questions available

Interactive Quizzes

Quick quizzes to reinforce your learning

Question 1

What is the typical gas used to etch SiO₂?

Cl₂
CF₄
SF₆

💡 Hint: Think about fluorinated gas chemistries.

Question 2

True or False: Selectivity allows for the etching of one material while preserving others.

True
False

💡 Hint: Think about how layers interact during etching.

2 more questions available

Challenge Problems

Push your limits with advanced challenges

Challenge 1 Hard

Analyze a scenario where an engineer used H₃PO₄ on SiO₂ instead of SF₆. Predict the outcome and explain the implications.

💡 Hint: Consider the properties of the chemicals.

Challenge 2 Hard

Evaluate the interactions of using chlorine-based chemistry in an oxygen-rich environment for etching aluminum. What issues could arise?

💡 Hint: Think about how different chemicals can react together.

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Reference links

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