Practice Common Etch Chemistries - 4.3.3 | 4. Etching and Deposition Processes | Advanced Semiconductor Manufacturing
K12 Students

Academics

AI-Powered learning for Grades 8–12, aligned with major Indian and international curricula.

Academics
Professionals

Professional Courses

Industry-relevant training in Business, Technology, and Design to help professionals and graduates upskill for real-world careers.

Professional Courses
Games

Interactive Games

Fun, engaging games to boost memory, math fluency, typing speed, and English skills—perfect for learners of all ages.

games

Practice Questions

Test your understanding with targeted questions related to the topic.

Question 1

Easy

What gas is typically used to etch SiO₂?

💡 Hint: Think about fluorinated compounds.

Question 2

Easy

Which gas is used for etching Si₃N₄?

💡 Hint: Consider common gases with sulphur.

Practice 4 more questions and get performance evaluation

Interactive Quizzes

Engage in quick quizzes to reinforce what you've learned and check your comprehension.

Question 1

What is the typical gas used to etch SiO₂?

  • Cl₂
  • CF₄
  • SF₆

💡 Hint: Think about fluorinated gas chemistries.

Question 2

True or False: Selectivity allows for the etching of one material while preserving others.

  • True
  • False

💡 Hint: Think about how layers interact during etching.

Solve 2 more questions and get performance evaluation

Challenge Problems

Push your limits with challenges.

Question 1

Analyze a scenario where an engineer used H₃PO₄ on SiO₂ instead of SF₆. Predict the outcome and explain the implications.

💡 Hint: Consider the properties of the chemicals.

Question 2

Evaluate the interactions of using chlorine-based chemistry in an oxygen-rich environment for etching aluminum. What issues could arise?

💡 Hint: Think about how different chemicals can react together.

Challenge and get performance evaluation