Practice Step 5: Example – ALD Simulation in Python - 4.7 | 4. Etching and Deposition Processes | Advanced Semiconductor Manufacturing
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Practice Questions

Test your understanding with targeted questions related to the topic.

Question 1

Easy

What does ALD stand for?

💡 Hint: Think about what layer means in the context of thin films.

Question 2

Easy

How many Angstroms are added per ALD cycle in our example?

💡 Hint: Refer to the growth_per_cycle variable in the code.

Practice 4 more questions and get performance evaluation

Interactive Quizzes

Engage in quick quizzes to reinforce what you've learned and check your comprehension.

Question 1

What is the growth rate of film thickness per ALD cycle in the example?

  • 1 Angstrom
  • 1.1 Angstroms
  • 1.5 Angstroms
  • 2 Angstroms

💡 Hint: Check the variable used to represent film growth.

Question 2

True or False: ALD can only be used for transparent films.

  • True
  • False

💡 Hint: Consider the range of materials you've studied that can be deposited.

Solve 1 more question and get performance evaluation

Challenge Problems

Push your limits with challenges.

Question 1

In a different simulation where the growth rate is modified to 2 Å per cycle, how thick would the film be after 50 cycles?

💡 Hint: Use the formula thickness = cycles × growth rate.

Question 2

If the ALD process exhibits non-linear growth due to chemical reactions and the growth rate doubles after 100 cycles, what would the film thickness be after 150 cycles, assuming it started at 50 Å?

💡 Hint: Break down the calculations into segments based on growth rates.

Challenge and get performance evaluation