Practice Step 1: Etching Processes - 4.3 | 4. Etching and Deposition Processes | Advanced Semiconductor Manufacturing
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Practice Questions

Test your understanding with targeted questions related to the topic.

Question 1

Easy

What is wet etching?

πŸ’‘ Hint: Think about the phase of the etching process.

Question 2

Easy

What type of etching uses plasma?

πŸ’‘ Hint: Consider technologies that require precision.

Practice 4 more questions and get performance evaluation

Interactive Quizzes

Engage in quick quizzes to reinforce what you've learned and check your comprehension.

Question 1

Which of the following is a characteristic of wet etching?

  • Isotropic
  • Directional
  • Plasma-assisted

πŸ’‘ Hint: Consider the phase and control of the etching process.

Question 2

True or False: RIE is used primarily for isotropic etching.

  • True
  • False

πŸ’‘ Hint: Recall RIE's purpose and properties.

Solve 2 more questions and get performance evaluation

Challenge Problems

Push your limits with challenges.

Question 1

Given a semiconductor design requiring vertical features with minimal damage, which etching technique would you recommend and why?

πŸ’‘ Hint: Think about the properties needed for verticality and damage control.

Question 2

Discuss how material compatibility influences the choice of etching chemistry when working with a multi-layer device.

πŸ’‘ Hint: Consider each layer's material properties and reaction characteristics.

Challenge and get performance evaluation