8.3. Key Processes in MEMS Fabrication

Try these first

1. 1.

   What is the first step in photolithography?

   Hint

   Think about what you need to cover the wafer first.

2. 2.

   What does PVD stand for?

   Hint

   Recall the 'physical' aspect of vaporizing materials.

3. 3.

   What is the first step in photolithography?

   • Apply photoresist
   • Develop photoresist
   • Expose photoresist

   Hint

   Consider what needs to be done before any exposure occurs.

4. 4.

   Dry etching is primarily used because it allows for...

   • Isotropic material removal
   • Higher aspect ratio with vertical sidewalls
   • Slower etching rate

   Hint

   Think about why we'd need precise shapes in MEMS.

5. 5.

   Discuss the complete process of photolithography as applied in a MEMS fabrication scenario, including applications and materials involved.

   Hint

   Think about each step's role in creating precision in MEMS.

6. 6.

   Analyze how the choice between wet etching and dry etching might affect manufacturability and performance of MEMS devices.

   Hint

   Consider the effects of etching types on device geometry.