Practice Working Principle - 7.3.1 | Chapter 7: Fabrication and Nanolithography Techniques | Nanotechnology Basic
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Working Principle

7.3.1 - Working Principle

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Practice Questions

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Question 1 Easy

What does EBL stand for?

💡 Hint: Think about the method using focused electrons.

Question 2 Easy

What is the main advantage of EBL over photolithography?

💡 Hint: Remember how small features can EBL create?

4 more questions available

Interactive Quizzes

Quick quizzes to reinforce your learning

Question 1

What is one major advantage of Electron-Beam Lithography?

High cost
Low speed
High resolution

💡 Hint: Remember what EBL can achieve that is not possible with other methods.

Question 2

True or False: EBL requires a physical mask for patterning.

True
False

💡 Hint: Think about the method's mechanism.

2 more questions available

Challenge Problems

Push your limits with advanced challenges

Challenge 1 Hard

Design a new application of EBL in a field of your choice. What specific advantages would it provide?

💡 Hint: Consider high-precision sectors.

Challenge 2 Hard

Analyze a real-world issue in manufacturing that could potentially be solved by improving EBL techniques. What improvements would you suggest?

💡 Hint: Think about efficiency in nanofabrication.

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