Practice Working Principle - 7.3.1 | Chapter 7: Fabrication and Nanolithography Techniques | Nanotechnology Basic
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Practice Questions

Test your understanding with targeted questions related to the topic.

Question 1

Easy

What does EBL stand for?

πŸ’‘ Hint: Think about the method using focused electrons.

Question 2

Easy

What is the main advantage of EBL over photolithography?

πŸ’‘ Hint: Remember how small features can EBL create?

Practice 4 more questions and get performance evaluation

Interactive Quizzes

Engage in quick quizzes to reinforce what you've learned and check your comprehension.

Question 1

What is one major advantage of Electron-Beam Lithography?

  • High cost
  • Low speed
  • High resolution

πŸ’‘ Hint: Remember what EBL can achieve that is not possible with other methods.

Question 2

True or False: EBL requires a physical mask for patterning.

  • True
  • False

πŸ’‘ Hint: Think about the method's mechanism.

Solve 2 more questions and get performance evaluation

Challenge Problems

Push your limits with challenges.

Question 1

Design a new application of EBL in a field of your choice. What specific advantages would it provide?

πŸ’‘ Hint: Consider high-precision sectors.

Question 2

Analyze a real-world issue in manufacturing that could potentially be solved by improving EBL techniques. What improvements would you suggest?

πŸ’‘ Hint: Think about efficiency in nanofabrication.

Challenge and get performance evaluation