Practice Dry Etching (Plasma-Based) - 8.4.1 | 8. Lithography and Etching Processes Specific to Compound Semiconductors | Compound Semiconductors
K12 Students

Academics

AI-Powered learning for Grades 8–12, aligned with major Indian and international curricula.

Academics
Professionals

Professional Courses

Industry-relevant training in Business, Technology, and Design to help professionals and graduates upskill for real-world careers.

Professional Courses
Games

Interactive Games

Fun, engaging games to boost memory, math fluency, typing speed, and English skillsβ€”perfect for learners of all ages.

games

Practice Questions

Test your understanding with targeted questions related to the topic.

Question 1

Easy

What is the primary advantage of dry etching in semiconductor fabrication?

πŸ’‘ Hint: Think about the level of detail required in semiconductor patterns.

Question 2

Easy

Name one gas commonly used in RIE.

πŸ’‘ Hint: It’s a reactive gas that begins with 'C.'

Practice 4 more questions and get performance evaluation

Interactive Quizzes

Engage in quick quizzes to reinforce what you've learned and check your comprehension.

Question 1

What is the key benefit of using dry etching?

  • A. Less precision
  • B. Higher temperatures
  • C. High precision

πŸ’‘ Hint: Consider what is essential for semiconductor devices.

Question 2

True or False: ICP etching provides lower ion density than RIE.

  • True
  • False

πŸ’‘ Hint: Remember which process provides more energetic ions.

Solve 1 more question and get performance evaluation

Challenge Problems

Push your limits with challenges.

Question 1

Consider a scenario where you must achieve a deeper etch on a GaN layer while maintaining selectivity. Design a new etching approach, discussing your rationale for gas selection, power settings, and process conditions.

πŸ’‘ Hint: Focus on how different gases affect etch characteristics.

Question 2

You are tasked with reducing etch damage in a sensitive InP sample. Propose specific steps you would take in the etching process to mitigate these risks.

πŸ’‘ Hint: Think about the balance between effective etching and protecting the material.

Challenge and get performance evaluation