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Test your understanding with targeted questions related to the topic.
Question 1
Easy
What is the primary advantage of dry etching in semiconductor fabrication?
π‘ Hint: Think about the level of detail required in semiconductor patterns.
Question 2
Easy
Name one gas commonly used in RIE.
π‘ Hint: Itβs a reactive gas that begins with 'C.'
Practice 4 more questions and get performance evaluation
Engage in quick quizzes to reinforce what you've learned and check your comprehension.
Question 1
What is the key benefit of using dry etching?
π‘ Hint: Consider what is essential for semiconductor devices.
Question 2
True or False: ICP etching provides lower ion density than RIE.
π‘ Hint: Remember which process provides more energetic ions.
Solve 1 more question and get performance evaluation
Push your limits with challenges.
Question 1
Consider a scenario where you must achieve a deeper etch on a GaN layer while maintaining selectivity. Design a new etching approach, discussing your rationale for gas selection, power settings, and process conditions.
π‘ Hint: Focus on how different gases affect etch characteristics.
Question 2
You are tasked with reducing etch damage in a sensitive InP sample. Propose specific steps you would take in the etching process to mitigate these risks.
π‘ Hint: Think about the balance between effective etching and protecting the material.
Challenge and get performance evaluation