Practice - Dry Etching (Plasma-Based)
Practice Questions
Test your understanding with targeted questions
What is the primary advantage of dry etching in semiconductor fabrication?
💡 Hint: Think about the level of detail required in semiconductor patterns.
Name one gas commonly used in RIE.
💡 Hint: It’s a reactive gas that begins with 'C.'
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Interactive Quizzes
Quick quizzes to reinforce your learning
What is the key benefit of using dry etching?
💡 Hint: Consider what is essential for semiconductor devices.
True or False: ICP etching provides lower ion density than RIE.
💡 Hint: Remember which process provides more energetic ions.
1 more question available
Challenge Problems
Push your limits with advanced challenges
Consider a scenario where you must achieve a deeper etch on a GaN layer while maintaining selectivity. Design a new etching approach, discussing your rationale for gas selection, power settings, and process conditions.
💡 Hint: Focus on how different gases affect etch characteristics.
You are tasked with reducing etch damage in a sensitive InP sample. Propose specific steps you would take in the etching process to mitigate these risks.
💡 Hint: Think about the balance between effective etching and protecting the material.
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Reference links
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