Practice Etching Techniques for Compound Semiconductors - 8.4 | 8. Lithography and Etching Processes Specific to Compound Semiconductors | Compound Semiconductors
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Practice Questions

Test your understanding with targeted questions related to the topic.

Question 1

Easy

What is the primary purpose of etching in semiconductor fabrication?

πŸ’‘ Hint: Think about what shapes we create.

Question 2

Easy

Name one dry etching technique used for compound semiconductors.

πŸ’‘ Hint: Look for terms starting with R or I.

Practice 4 more questions and get performance evaluation

Interactive Quizzes

Engage in quick quizzes to reinforce what you've learned and check your comprehension.

Question 1

What does RIE stand for?

  • Reactive Ion Etching
  • Radiation Ion Etching
  • Relative Ion Etching

πŸ’‘ Hint: Think about common terms in etching.

Question 2

True or False: Wet etching is more precise than dry etching methods like RIE.

  • True
  • False

πŸ’‘ Hint: Recall how each method operates.

Solve and get performance evaluation

Challenge Problems

Push your limits with challenges.

Question 1

You are tasked with designing a GaN HEMT device that requires deep trenches. Which etching method would you choose, and what parameters would you focus on?

πŸ’‘ Hint: Consider the requirement for depth and profile type.

Question 2

Given an issue with surface roughness on a GaAs wafer after wet etching, explain potential reasons and suggest improvements.

πŸ’‘ Hint: Reflect on how etch methods affect surface quality.

Challenge and get performance evaluation