Practice Etching Techniques For Compound Semiconductors (8.4) - Lithography and Etching Processes Specific to Compound Semiconductors
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Etching Techniques for Compound Semiconductors

Practice - Etching Techniques for Compound Semiconductors

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Practice Questions

Test your understanding with targeted questions

Question 1 Easy

What is the primary purpose of etching in semiconductor fabrication?

💡 Hint: Think about what shapes we create.

Question 2 Easy

Name one dry etching technique used for compound semiconductors.

💡 Hint: Look for terms starting with R or I.

4 more questions available

Interactive Quizzes

Quick quizzes to reinforce your learning

Question 1

What does RIE stand for?

Reactive Ion Etching
Radiation Ion Etching
Relative Ion Etching

💡 Hint: Think about common terms in etching.

Question 2

True or False: Wet etching is more precise than dry etching methods like RIE.

True
False

💡 Hint: Recall how each method operates.

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Challenge Problems

Push your limits with advanced challenges

Challenge 1 Hard

You are tasked with designing a GaN HEMT device that requires deep trenches. Which etching method would you choose, and what parameters would you focus on?

💡 Hint: Consider the requirement for depth and profile type.

Challenge 2 Hard

Given an issue with surface roughness on a GaAs wafer after wet etching, explain potential reasons and suggest improvements.

💡 Hint: Reflect on how etch methods affect surface quality.

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Reference links

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