Practice - Masking Materials and Etch Selectivity
Practice Questions
Test your understanding with targeted questions
What is the preferred masking material for GaN?
💡 Hint: Look for materials known for their durability.
Which material is used for InP to avoid lateral etching?
💡 Hint: Remember the specific challenges of InP.
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Interactive Quizzes
Quick quizzes to reinforce your learning
What is the primary benefit of using Ni as a masking material for GaN?
💡 Hint: Consider which material offers the strongest protection during etching.
True or False: Si₃N₄ is often used to ensure better control of lateral etching in InP.
💡 Hint: Think about the fundamental purpose of materials used in etching.
1 more question available
Challenge Problems
Push your limits with advanced challenges
Given a scenario where a fabricator uses only photoresist for GaN instead of Ni, discuss the potential consequences on etch selectivity and device performance.
💡 Hint: Reflect on how material properties change under etching conditions.
Design a series of experiments to evaluate the performance differences between SiO₂ and Si₃N₄ in practical applications for GaN and InP. What factors would you consider?
💡 Hint: Think about the process parameters and what metrics would signify success in targeting etch qualities.
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Reference links
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