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Practice Questions
Test your understanding with targeted questions related to the topic.
Question 1
Easy
What is the preferred masking material for GaN?
💡 Hint: Look for materials known for their durability.
Question 2
Easy
Which material is used for InP to avoid lateral etching?
💡 Hint: Remember the specific challenges of InP.
Practice 4 more questions and get performance evaluation
Interactive Quizzes
Engage in quick quizzes to reinforce what you've learned and check your comprehension.
Question 1
What is the primary benefit of using Ni as a masking material for GaN?
- Low cost
- High selectivity and durability
- Easier processing
💡 Hint: Consider which material offers the strongest protection during etching.
Question 2
True or False: Si₃N₄ is often used to ensure better control of lateral etching in InP.
- True
- False
💡 Hint: Think about the fundamental purpose of materials used in etching.
Solve 1 more question and get performance evaluation
Challenge Problems
Push your limits with challenges.
Question 1
Given a scenario where a fabricator uses only photoresist for GaN instead of Ni, discuss the potential consequences on etch selectivity and device performance.
💡 Hint: Reflect on how material properties change under etching conditions.
Question 2
Design a series of experiments to evaluate the performance differences between SiO₂ and Si₃N₄ in practical applications for GaN and InP. What factors would you consider?
💡 Hint: Think about the process parameters and what metrics would signify success in targeting etch qualities.
Challenge and get performance evaluation