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Practice Questions
Test your understanding with targeted questions related to the topic.
Question 1
Easy
What is a critical dimension (CD)?
💡 Hint: Think about the minimum size necessary for functionality.
Question 2
Easy
Name one method used for post-etch cleaning.
💡 Hint: Consider what needs to be removed after etching.
Practice 4 more questions and get performance evaluation
Interactive Quizzes
Engage in quick quizzes to reinforce what you've learned and check your comprehension.
Question 1
What does SEM stand for in metrology?
- Scanning Electron Microscopy
- Standardized Electron Measurement
- Static Enhanced Microscopy
💡 Hint: It's a microscopy technique involving electrons.
Question 2
True or False: Post-etch cleaning is optional in semiconductor fabrication.
- True
- False
💡 Hint: Consider the potential consequences of skipping this step.
Solve 1 more question and get performance evaluation
Challenge Problems
Push your limits with challenges.
Question 1
If a semiconductor has a critical dimension of 100 nm, but the SEM analysis shows a feature size of 120 nm, what potential issues could arise in the device performance?
💡 Hint: Consider how dimensions relate to electrical and optical properties.
Question 2
Propose potential strategies to improve post-etch cleaning efficacy in a semiconductor fabrication line.
💡 Hint: Think about physical and chemical methods for surface cleaning.
Challenge and get performance evaluation