Practice Metrology And Post-etch Cleaning (8.8) - Lithography and Etching Processes Specific to Compound Semiconductors
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Metrology and Post-Etch Cleaning

Practice - Metrology and Post-Etch Cleaning

Learning

Practice Questions

Test your understanding with targeted questions

Question 1 Easy

What is a critical dimension (CD)?

💡 Hint: Think about the minimum size necessary for functionality.

Question 2 Easy

Name one method used for post-etch cleaning.

💡 Hint: Consider what needs to be removed after etching.

4 more questions available

Interactive Quizzes

Quick quizzes to reinforce your learning

Question 1

What does SEM stand for in metrology?

Scanning Electron Microscopy
Standardized Electron Measurement
Static Enhanced Microscopy

💡 Hint: It's a microscopy technique involving electrons.

Question 2

True or False: Post-etch cleaning is optional in semiconductor fabrication.

True
False

💡 Hint: Consider the potential consequences of skipping this step.

1 more question available

Challenge Problems

Push your limits with advanced challenges

Challenge 1 Hard

If a semiconductor has a critical dimension of 100 nm, but the SEM analysis shows a feature size of 120 nm, what potential issues could arise in the device performance?

💡 Hint: Consider how dimensions relate to electrical and optical properties.

Challenge 2 Hard

Propose potential strategies to improve post-etch cleaning efficacy in a semiconductor fabrication line.

💡 Hint: Think about physical and chemical methods for surface cleaning.

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Reference links

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