Practice - Process Flow Example: GaN HEMT Mesa Etching
Practice Questions
Test your understanding with targeted questions
What is photoresist used for in the mesa etching process?
💡 Hint: Think about its role in defining areas for etching.
Name one method used for etching the hard mask.
💡 Hint: What kind of etching is common for mask materials?
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Interactive Quizzes
Quick quizzes to reinforce your learning
What is the primary purpose of applying photoresist during the mesa etching process?
💡 Hint: Think about the role of photoresist in the etching.
True or False: The hard mask is not required for GaN mesa etching.
💡 Hint: Consider the functions of a hard mask.
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Challenge Problems
Push your limits with advanced challenges
Imagine you are leading a team to etch GaN mesas for a new HEMT project. What strategy would you employ to ensure high yield and quality in the final product?
💡 Hint: Consider which steps ensure quality and what checks can be put in place.
If a batch of wafers shows inconsistent mesa heights post-etch, what processes would you investigate and how would you rectify the issue?
💡 Hint: Look at both the preparation and execution phases for potential discrepancies.
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Reference links
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