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Practice Questions
Test your understanding with targeted questions related to the topic.
Question 1
Easy
What is photoresist used for in the mesa etching process?
💡 Hint: Think about its role in defining areas for etching.
Question 2
Easy
Name one method used for etching the hard mask.
💡 Hint: What kind of etching is common for mask materials?
Practice 4 more questions and get performance evaluation
Interactive Quizzes
Engage in quick quizzes to reinforce what you've learned and check your comprehension.
Question 1
What is the primary purpose of applying photoresist during the mesa etching process?
- A. To remove material
- B. To define areas for etching
- C. To enhance conductivity
💡 Hint: Think about the role of photoresist in the etching.
Question 2
True or False: The hard mask is not required for GaN mesa etching.
- True
- False
💡 Hint: Consider the functions of a hard mask.
Solve and get performance evaluation
Challenge Problems
Push your limits with challenges.
Question 1
Imagine you are leading a team to etch GaN mesas for a new HEMT project. What strategy would you employ to ensure high yield and quality in the final product?
💡 Hint: Consider which steps ensure quality and what checks can be put in place.
Question 2
If a batch of wafers shows inconsistent mesa heights post-etch, what processes would you investigate and how would you rectify the issue?
💡 Hint: Look at both the preparation and execution phases for potential discrepancies.
Challenge and get performance evaluation