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Process variations in CMOS manufacturing significantly impact the performance of analog circuits by altering key parameters such as threshold voltage, channel length, and oxide thickness. These variations can lead to gain mismatches, offset voltages, and stability issues, affecting circuit accuracy and reliability. Various strategies, including design techniques and statistical analysis, are introduced to mitigate these effects, ensuring robust analog circuit functionality.
References
ee5-cmos-5.pdfClass Notes
Memorization
What we have learnt
Final Test
Revision Tests
Term: Process Variations
Definition: Variations in manufacturing processes that lead to differences in performance characteristics of individual IC components.
Term: Threshold Voltage (Vth)
Definition: The minimum voltage required to create a conducting path between the source and drain terminals of a transistor.
Term: Gain Mismatch
Definition: The difference in gain among multiple transistors in a circuit, which can lead to inaccuracies in the output signal.
Term: Monte Carlo Simulation
Definition: A statistical method used to assess the impact of process variations by running numerous simulations with random inputs.
Term: Corner Analysis
Definition: A technique for evaluating circuit performance under various manufacturing conditions, including typical, worst-case, and best-case scenarios.