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5.2.2. Etching Techniques

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  1. 1.

    What are the two main types of etching techniques discussed?

    Hint

    Think about the processes that involve liquids and gases.

  2. 2.

    Which etching technique typically provides more precision?

    Hint

    Consider which method uses plasma rather than chemicals.

  3. 3.

    What does wet etching primarily use to remove material?

    • Plasma
    • Chemical solutions
    • Laser
    Hint

    Think about the nature of the etching solution.

  4. 4.

    True or False: Dry etching allows for more complex structures than wet etching.

    • True
    • False
    Hint

    Consider the levels of detail achievable with each method.

  5. 5.

    Design a MEMS device that could utilize both wet and dry etching techniques and explain your reasoning.

    Hint

    Consider what parts of the device need precision versus those needing simple shapes.

  6. 6.

    Critique the advantages of using dry etching for an accelerometer fabricating process compared to wet etching, considering material properties.

    Hint

    Examine how each technique affects the properties of the final device.

Exercises

Total Questions

2

Estimated Time

4 min

Passing Score

70%

Instructions

  • Read each question carefully
  • You can use hints if you need help
  • Complete all questions before submitting

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Quiz

Total Questions

2

Estimated Time

4 min

Passing Score

70%

Instructions

  • Read each question carefully
  • You can use hints if you need help
  • Complete all questions before submitting

2 more questions available

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Challenge Problems

Total Questions

2

Estimated Time

4 min

Passing Score

70%

Instructions

  • Read each question carefully
  • You can use hints if you need help
  • Complete all questions before submitting