Practice Etching Processes - 2.3.3 | 2. Design and Implement Microfabrication Processes | Microfabrication and Semiconductor materials
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Practice Questions

Test your understanding with targeted questions related to the topic.

Question 1

Easy

What is the purpose of etching in microfabrication?

πŸ’‘ Hint: Think about pattern creation.

Question 2

Easy

Name one gas used in the Deep RIE process.

πŸ’‘ Hint: It's a sulfur compound.

Practice 4 more questions and get performance evaluation

Interactive Quizzes

Engage in quick quizzes to reinforce what you've learned and check your comprehension.

Question 1

What is the Bosch process primarily used for?

  • Selective deposition
  • Deep etching
  • Thin film growth

πŸ’‘ Hint: Focus on its function.

Question 2

True or False: Selectivity is the measure of the etch rate of the film compared to the etch rate of the mask.

  • True
  • False

πŸ’‘ Hint: Think about how we evaluate etching efficiency.

Solve 2 more questions and get performance evaluation

Challenge Problems

Push your limits with challenges.

Question 1

If a certain Deep RIE process has an etch rate of 70 nm/min for a silicon film and 14 nm/min for the mask, calculate the selectivity. What does this imply about the etching effectiveness?

πŸ’‘ Hint: Recap the definition of selectivity.

Question 2

Discuss the impact of enhancing selectivity in the Bosch process. How might process parameters need to be adjusted in order to achieve this goal?

πŸ’‘ Hint: Consider variables affecting etching gases.

Challenge and get performance evaluation