Detailed Overview of p-n Junctions
The p-n junction serves as the building block for various semiconductor devices, including diodes and transistors. Understanding its formation and behavior under applied voltage is crucial for analyzing semiconductor operations.
Formation of a p-n Junction
A p-n junction is created when a p-type semiconductor, rich in holes, is joined with an n-type semiconductor, rich in electrons. During the formation process, diffusion occurs due to concentration gradients across the junction. Electrons from the n-side diffuse to the p-side and holes from the p-side diffuse to the n-side, creating a depletion region devoid of free charge carriers. Ionized donor and acceptor atoms remain behind, forming an electric field that counters further diffusion.
Behavior Under Biasing
When an external voltage is applied to the p-n junction, its behavior changes:
- Forward Bias: Connecting the p-side to the positive terminal of the battery reduces the barrier potential, allowing significant current flow as electrons and holes recombine and inject into the opposite regions.
- Reverse Bias: This applies the opposite configuration, widening the depletion region and increasing the barrier potential. The junction allows negligible current flow dominated by minority carriers.
The balance of these currents and electric fields determines the overall functionality of semiconductor devices.