Practice Silicidation and Contacts - 5.3.5 | 5. FinFET Device Structure and Operation | Electronic Devices 2
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Practice Questions

Test your understanding with targeted questions related to the topic.

Question 1

Easy

What is silicidation?

πŸ’‘ Hint: Think about the interaction between metals and silicon.

Question 2

Easy

Why is low-resistance contact important?

πŸ’‘ Hint: Consider how current flows through a device.

Practice 4 more questions and get performance evaluation

Interactive Quizzes

Engage in quick quizzes to reinforce what you've learned and check your comprehension.

Question 1

What is the main purpose of silicidation in FinFETs?

  • Increase silicon thickness
  • Form low-resistance electrical contacts
  • Enhance silicon surface roughness

πŸ’‘ Hint: Remember how silicidation affects electrical connections.

Question 2

True or False: Cobalt and Nickel are common metals used in the silicidation process.

  • True
  • False

πŸ’‘ Hint: Consider the material’s properties in electrical applications.

Solve 1 more question and get performance evaluation

Challenge Problems

Push your limits with challenges.

Question 1

If a new metal is proposed for silicidation that forms a poor quality silicide, what impacts would you anticipate on the FinFET's performance?

πŸ’‘ Hint: Consider how variations in metal-silicon interaction influence electrical characteristics.

Question 2

Evaluate the implications of high interface roughness on the silicidation process in terms of yield and performance.

πŸ’‘ Hint: Think about how imperfections at the interface might disrupt electrical flow.

Challenge and get performance evaluation