Practice Silicidation And Contacts (5.3.5) - FinFET Device Structure and Operation
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Silicidation and Contacts

Practice - Silicidation and Contacts

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Practice Questions

Test your understanding with targeted questions

Question 1 Easy

What is silicidation?

💡 Hint: Think about the interaction between metals and silicon.

Question 2 Easy

Why is low-resistance contact important?

💡 Hint: Consider how current flows through a device.

4 more questions available

Interactive Quizzes

Quick quizzes to reinforce your learning

Question 1

What is the main purpose of silicidation in FinFETs?

Increase silicon thickness
Form low-resistance electrical contacts
Enhance silicon surface roughness

💡 Hint: Remember how silicidation affects electrical connections.

Question 2

True or False: Cobalt and Nickel are common metals used in the silicidation process.

True
False

💡 Hint: Consider the material’s properties in electrical applications.

1 more question available

Challenge Problems

Push your limits with advanced challenges

Challenge 1 Hard

If a new metal is proposed for silicidation that forms a poor quality silicide, what impacts would you anticipate on the FinFET's performance?

💡 Hint: Consider how variations in metal-silicon interaction influence electrical characteristics.

Challenge 2 Hard

Evaluate the implications of high interface roughness on the silicidation process in terms of yield and performance.

💡 Hint: Think about how imperfections at the interface might disrupt electrical flow.

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Reference links

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